The deployment of deep neural networks in safety-critical systems necessitates reliable and efficient uncertainty quantification (UQ). A practical and widespread strategy for UQ is repurposing stochastic regularizers as scalable approximate Bayesian inference methods, such as Monte Carlo Dropout (MCD) and MC-DropBlock (MCDB). However, this paradigm remains under-explored for Stochastic Depth (SD), a regularizer integral to the residual-based backbones of most modern architectures. While prior work demonstrated its empirical promise for segmentation, a formal theoretical connection to Bayesian variational inference and a benchmark on complex, multi-task problems like object detection are missing. In this paper, we first provide theoretical insights connecting Monte Carlo Stochastic Depth (MCSD) to principled approximate variational inference. We then present the first comprehensive empirical benchmark of MCSD against MCD and MCDB on state-of-the-art detectors (YOLO, RT-DETR) using the COCO and COCO-O datasets. Our results position MCSD as a robust and computationally efficient method that achieves highly competitive predictive accuracy (mAP), notably yielding slight improvements in calibration (ECE) and uncertainty ranking (AUARC) compared to MCD. We thus establish MCSD as a theoretically-grounded and empirically-validated tool for efficient Bayesian approximation in modern deep learning.

These works are regarded as passive works for object detection as they take the input image as is. However, convergence to global minima is not guaranteed to be optimal in neural networks; therefore, we argue that the trained weights in the object detector are not optimal. To rectify this problem, we propose a wrapper based on proactive schemes, PrObeD, which enhances the performance of these object detectors by learning a signal. PrObeD consists of an encoder-decoder architecture, where the encoder network generates an image-dependent signal termed templates to encrypt the input images, and the decoder recovers this template from the encrypted images. We propose that learning the optimum template results in an object detector with an improved detection performance. The template acts as a mask to the input images to highlight semantics useful for the object detector. Finetuning the object detector with these encrypted images enhances the detection performance for both generic and camouflaged.

As aresult, there is aproliferation of distinct architectures and loss functions for different vision tasks.

Existing object detection frameworks are usually built on a single format of object/part representation, i.e., anchor/proposal rectangle boxes in RetinaNet and Faster R-CNN, center points in FCOS and RepPoints, and corner points in CornerNet. While these different representations usually drive the frameworks to perform well in different aspects, e.g., better classification or finer localization, it is in general difficult to combine these representations in a single framework to make good use of each strength, due to the heterogeneous or non-grid feature extraction by different representations.

The efficacy of Artificial Intelligence (AI) in micro/nano manufacturing is fundamentally constrained by the scarcity of high-quality and physically grounded training data for defect inspection. Lithography defect data from semiconductor industry are rarely accessible for research use, resulting in a shortage of publicly available datasets. To address this bottleneck in lithography, this study proposes a novel methodology for generating large-scale, physically valid defect datasets with pixel-level annotations. The framework begins with the ab initio synthesis of defect layouts using controllable, physics-constrained mathematical morphology operations (erosion and dilation) applied to the original design-level layout. These synthesized layouts, together with their defect-free counterparts, are fabricated into physical samples via high-fidelity digital micromirror device (DMD)-based lithography. Optical micrographs of the synthesized defect samples and their defect-free references are then compared to create consistent defect delineation annotations. Using this methodology, we constructed a comprehensive dataset of 3,530 Optical micrographs containing 13,365 annotated defect instances including four classes: bridge, burr, pinch, and contamination. Each defect instance is annotated with a pixel-accurate segmentation mask, preserving full contour and geometry. The segmentation-based Mask R-CNN achieves AP@0.5 of 0.980, 0.965, and 0.971, compared with 0.740, 0.719, and 0.717 for Faster R-CNN on bridge, burr, and pinch classes, representing a mean AP@0.5 improvement of approximately 34%. For the contamination class, Mask R-CNN achieves an AP@0.5 roughly 42% higher than Faster R-CNN. These consistent gains demonstrate that our proposed methodology to generate defect datasets with pixel-level annotations is feasible for robust AI-based Measurement/Inspection (MI) in semiconductor fabrication.

VOC datasets (e.g., 83.6% mAP on the 2007 set) with the 101-layer ResNet. Meanwhile, our result is achieved at a test-time speed of 170ms per image, 2.5-20